1단계
| Photothermally Tunable Diffraction Gating Based on Reduced Graphene Oxide Induced by Femtosecond Laser Writing |
| 차년도 | 3차년도 | 세부 | 총괄세부 |
| 학술대회명 | Photonics Conference 2020 | 발표년월일 | 202011 |
| 학술대회 구분 | 국내 | 개최국 | 대한민국 |
| 총 저자수 | 5 | 기여도 | 50 |
| 논문저자명 | Shiru Jiang, 박철순, 이우빈, Changyi Zhou, 이상신 | ||
| PDF 파일 |
075_202011_Photothermally Tunable Diffraction Gating Based on Reduced Graphene Oxide Induced by Femtosecond Laser Writing.pdf
(7.6M)
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DATE : 2021-01-04 20:01:53
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075_202011_Photothermally Tunable Diffraction Gating Based on Reduced Graphene Oxide Induced by Femtosecond Laser Writing.pdf
(7.6M)


